Fig. 5: Roughening of the TFE barrier by plasma etching and effect on light outcoupling. | Nature Communications

Fig. 5: Roughening of the TFE barrier by plasma etching and effect on light outcoupling.

From: A substrateless, flexible, and water-resistant organic light-emitting diode

Fig. 5

a Stack architecture of flexible top-emitting OLED with TFE barriers. b AFM topography image of a pristine parylene-C surface. c Topography of same surface after roughening by RIE on the same scale as in b. d Current density vs. voltage characteristics of pristine OLED and after RIE treatment. e 2D map of normalized, angle-resolved EL spectra for pristine OLED. f Same for RIE treated OLED. g Comparison of power efficacy between OLEDs with pristine and RIE treated TFE layers.

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