Fig. 2: X-Ray diffraction.
From: Topotactic fluorination of intermetallics as an efficient route towards quantum materials
a Illustration of the LaFeSi fluorination upon C4F8 treatment, after which the F atoms are inserted into the 2b Wyckoff positions of the P4/nmm structure. b Indexed powder X-ray diffraction patterns of LaFeSi (a = 4.11 Å, c = 7.16 Å) and LaFeSiFx (a = 4.03 Å, c = 8.09 Å). The successful fluorination of the LaFeSi intermetallic is clearly evidenced through the shift of the Bragg peaks position. c Indexed precession images of the single-crystal X-ray diffraction pattern of a 50 × 50 × 10 µm3 LaFeSiF0.2 crystal (a = 4.05 Å, c = 8.11 Å) corresponding to (hk0) and (0kl) family planes of the reciprocal space. d Rietveld refinement of the LaFeSiFx powder sample. All structural parameters were refined except the F content x whose accuracy is not sufficient from powder data.
