Fig. 2: Self-assembly engineering for controlling the formation of ANC superlattices.
a TEM image and photograph of colloidal solution exposed to UV light for the synthesized ANCs. b Representative AFM height image and photograph exposed to UV light for the fabricated ANC superlattice film in (g). c Cross-sectional height profile corresponding to the black line in (b), revealing lateral assembly of ANCs in the xy (substrate) plane. d Schematics of ANC ANSL showing the superlattice ab plane coincides with the xy plane and the SL c axis in parallel to the z vector. GIWAXS (top) and GISAXS (bottom) patterns for the drop-casted film (e), spin-coated film on poly-TPD (f), spin-coated film on low-surface-energy X-F6-TAPC (g), and spin-coated film on X-F6-TAPC comprising NPLs synthesized using OLA ligands (h). The Miller index (a b c)SL refers to a superlattice plane. i qxy cuts for the GISAXS patterns in (e–h). j Comparison of orientation distribution function for the emissive films considered here using the normalized scattering intensity of the (100) DS ring with respect to χ, revealing an enhanced horizontal orientation upon ANSL formation.
