Fig. 3: Structural, morphological and optical characterization.
From: Chemical deposition of Cu2O films with ultra-low resistivity: correlation with the defect landscape
a GI-XRD, and b RAMAN measurements, of samples deposited at 260 °C with 0%, 5% and 15% oxygen fraction. c Cross-sectional TEM analysis, d Selected area diffraction patterns from plane view, and e SEM pictures of Cu2O thin films deposited on a borosilicate glass substrate at 260 °C with different oxygen fractions (0%–5%–15%–25%). (Insets show optical images of the corresponding films).
