Fig. 1: MoS₂ metastructures.

a A schematic diagram to outline the chemical vapor deposition (CVD) bottom-up fabrication process. The photoresist ZEP-520A is patterned by the electron beam lithography, forming the designed ZEP nanomask on the substrate (I). b The optical microscope image of 1D MoS₂ gratings with various periods \(P\) (from 400 nm to 600 nm with a step of 50 nm) and filling factors \(\varLambda\) (from 0.3 to 0.7 with a step of 0.1). A zoomed-in scanning electron microscopy (SEM) image for A2 region is shown at the bottom. c Atomic force microscopy (AFM) images of Mo pattern and MoS₂ pattern (A2 region). d Height profiles contrast of Mo pattern (green line) and MoS₂ pattern (red line) indicated by the dashed lines in (c). e–g Same as (b–d) but for the 2D MoS₂ disk arrays.