Fig. 5: Nanomesh patterning process.
From: Van der Waals nanomesh electronics on arbitrary surfaces
a Schematic illustrations of the Te nanomesh patterning process. b SEM images of patterned nanomeshes in USAF 1951 resolution test. Red dashed lines indicate the enlarged position. The light blue arrow shows a maximum patterning resolution of 228.1 line pairs per millimeter (lp/mm). c Optical images of halftone dots with different sizes and/or spacing that are made of patterned Te nanomeshes. d Optical images of Lake, Baboon, Peppers, and Goldhill images based on Te nanomeshes. e Optical image, f SEM image, and g transfer characteristic curves of the all-nanomesh TFT.
