Fig. 2: IāāāV hysteresis of CrOCl tunneling devices.

a Illustration of the tunneling device. b IāāāV curves of device 1 at 20 K (above the NĆ©el temperature) and 2 K (below the NĆ©el temperature). c 2D map of current polarization Ļ as a function of temperature and bias voltage. The green dashed line marks the NĆ©el temperature ofĀ the exfoliated CrOCl. d Ļ versus temperature at different voltages extracted from b. e Resistance versus temperature ofĀ the CrOCl tunneling device at 5āV in different sweeping processes. f Tunneling resistance versus out-of-plane magnetic field atāāā5āV in different sweeping processes. g Reproducible manipulation of the resistance states atāāā0.8 V by alternately changing the sweeping direction. Data in aāf were obtained in device 1 (ā~ā9.1ānm CrOCl), while g was obtained in device 2 (monolayer CrOCl) in parallel with a 10āMĪ© protection resistor.