Fig. 2: Resulting deposition efficiencies with and without enhancements.
From: Efficient electrospray deposition of surfaces smaller than the spray plume
a Deposition efficiency for trehalose spray coatings with all enhancements applied on an MNA (T1), a silicon chip (T2), and an electrode test pattern on a Borofloat glass chip (T3) where “T” represents “targets”. MNA substrates with a single enhancement removed are labeled as such: no negative-polarity ethanol pre-spray (-E1), no grounded extractor (-E2), no insulation on focus ring or extractor (-E3), no insulating silicone mask on the target (-E4), and no focus ring (-E5) where “-EX” represents “removing enhancement X with others in place”. Pairwise comparisons were conducted using ANOVA multiple comparisons tests. For all samples, n = 6. Error bars indicate standard deviation. Each point indicates a single measurement. ns = not significant; *p = 0.0213 (T1 vs. -E2) and 0.0201 (T1 vs. -E3); **p = 0.0079; ****p < 0.0001. Photographs of: b bare MNA, c trehalose-sprayed MNA without insulation on focus ring or extractor, d unmasked trehalose-sprayed MNA, e trehalose-sprayed MNA with all enhancements, f trehalose sprayed silicon chip, and g trehalose sprayed onto a microelectrode test pattern.
