Fig. 2: Characterization of metal nitrides.
a XRD patterns of laser-induced Li3N with the reference XRD patterns of: Li3N (01-075-8959), Li2O (01-086-3380), TiN (98-000-0339), Ti (04-003-5042); b N1s region of XPS spectra of laser-induced Li3N film: A strong N signal is observed on the surface and the N1s region displays three peaks at 396.1, 396.9, and 399.5 eV, which are assigned to N-Li22, N-Ti and N-O-Ti23, respectively; c Top-view SEM micrograph of Li3N film with d correlated EDXS element maps. It is worth noting that in the LINF process, Ti (substrate) also reacts with N2 to form TiN following a thermal nitridation process (Supplementary Fig. 28–29, Supplementary Table 3).
