Fig. 2: Formation mechanism of 3S-mesoUiO-66-NH2 HoMSs through dual-template-directed successive assembly and selective etching. | Nature Communications

Fig. 2: Formation mechanism of 3S-mesoUiO-66-NH2 HoMSs through dual-template-directed successive assembly and selective etching.

From: A facile dual-template-directed successive assembly approach to hollow multi-shell mesoporous metal–organic framework particles

Fig. 2

a Schematic models and their corresponding TEM images of UiO-66-NH2 nanostructures prepared by (b) ionic surfactant ODMB-directed, c polymer surfactant F127-directed, d ODMB/F127 dual-template-directed successive assembly, e dual-template-directed successive assembly three times, and (f) chemical etching of the multi-layer MOF precursor particle in acetic acid solution. g Formation mechanistic details of the dual-template-directed successive assembly and selective chemical etching.

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