Fig. 1: In-textile photolithography for conductive metal patterns in fabrics.
From: Well-defined in-textile photolithography towards permeable textile electronics
a Schematic illustration showing the development of textile electronics by in-textile photolithography technology. b Digital image of the Cu PCB circuit patterned in polyester fabric. Inset is the high-resolution image showing the Cu tracks in the fabric. c SEM image showing the boundary of the Cu pattern in polyester fabric. d Cross-sectional SEM image showing the boundary of the Cu pattern in polyester fabric. The numbers of experimental repetitions of c and d were five times, respectively. e Digital image showing the water vapor permeability and softness of the fabric patterned with Cu patterns. f Digital image of the Ag PCB circuit patterned in polyester fabric. g Digital image of the Ni interdigital electrodes with different scales patterned in polyester fabric. h Digital image of the Cu sensing electrode arrays patterned in glass-fiber fabric. i Digital image of the Ni electrode patterns in non-woven PP fabric.
