Table 1 Comparison of contact angle CA measurements, roughness sa measurements, and shear strengths τC of graphene on TEOS SiO2, Si3N4, and thermal SiO2 and of hBN on thermal SiO2
From: Button shear testing for adhesion measurements of 2D materials
TEOS SiO2 | Si3N4 | Thermal SiO2 | |||
---|---|---|---|---|---|
O2 plasma | No | Yes | No | No | Yes |
CAwater (°) | 7.3 ± 1.5 | 3.0 ± 1.3 | 19.3 ± 0.3 | 42.7 ± 0.3 | 2.7 ± 1.6 |
CAdiiodomethane (°) | 40.6 ± 0.4 | 35.3 ± 0.6 | 40.7 ± 1.8 | 45.2 ± 0.5 | 34.6 ± 0.3 |
Surface Energy (mN m−1) | 76.0 ± 0.6 | 77.4 ± 1.9 | 73.0 ± 0.6 | 60.6 ± 0.2 | 77.5 ± 1.8 |
Roughness sa of the substrate (nm) | 0.76 | 0.69 | 0.30 | 0.22 | 0.21 |
Roughness sa of graphene on the substrate (nm) | 0.64 | 0.42 | 0.22 | ||
Shear strength τC of graphene (MPa) | 1.55 ± 0.31 | 2.21 ± 0.33 | 2.88 ± 0.31 | 2.68 ± 0.11 | 2.77 ± 0.32 |
Shear strength τC of hBN (MPa) | 4.43 ± 0.95 |