Fig. 1: Schematic representation of annealing processes.
From: Crystallization of piezoceramic films on glass via flash lamp annealing
Heat distribution in a film, its substrate, and processing time in the case of a conventional box furnace annealing and b flash lamp annealing. Finite element modelling. Temperature profiles during c single-pulse and d 50-pulse flash lamp annealing of a 170 nm-PZT/fused silica glass stack. The red, purple, blue, and black lines correspond to the temperature profiles of the top PZT surface, the interface between the film and glass, 4 μm below this interface, and the bottom of the substrate (500 μm), respectively. Absolute temperature values are indicative only. The schematic structure of the sample is shown in the inset of c. The pulse duration, energy density and repetition rate are 130 μs, 3 J cm−2, and 3.5 Hz, respectively.
