Fig. 6: Application potential of ion-beam-induced-film-wetting technology.
From: Rewritable printing of ionic liquid nanofilm utilizing focused ion beam induced film wetting
The distinct features of ionic liquid and IBFW technique manifest potential application fields. The nanometer scale film thickness makes IBFW suitable for gas sensing circuit manufacturing. The good solubility of IL and the on-demand patterning capability make IBFW suitable for nanofluidic and reaction chip fabrication. The wide potential window and stability of IL reveal possibility in transforming IBFW liquid film pattern into various solid materials.
