Fig. 2: The underlying ligand crosslinking chemistry in CLIP-MOF.
From: Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography
a, b DLS data and TEM images of colloidal ZIF-8@BrijC10 containing bisPFPA crosslinkers (bisPFPA/MOF ≈ 10 wt%) before (gray shaded area) and after (olive shaded area) 254 nm UV irradiation. Scale bars, 100 nm. c FTIR Spectra of thin films made from colloidal solution of ZIF-8@BrijC10 with bisPFPA and exposed to UV light with different doses. The asymmetric stretching of –N3 in bisPFPA diminished in the course of 0–60 mJ cm−2, indicating the rapid formation of nitrene radicals for subsequent crosslinking. d XPS (C1s, N1s, F1s) spectra of film samples of pristine HKUST-1@OA, bisPFPA, and HKUST-1@OA/bisPFPA treated by CLIP-MOF procedures (UV exposure and developing to remove unreacted crosslinkers, labeled as CLIP-MOF). The colored shaded areas in C1s spectra correspond to contribution from different bonds, as indicated by the arrows. Source data are provided as a Source Data file.
