Fig. 1: Design concepts for optimal crystal plane growth mechanism.

a Schematic diagram of isomorphic crystal plane growth. b Electrodeposition schematic representation of the homogeneous nucleated state. c Schematic diagram of heteromorphic plane growth. d Electrodeposition schematic representation of random nucleated state. e–h Surface atomic arrangements. i XRD patterns and j histograms for the corresponding fitted RTC. k The activation energies of the different aluminum anodes.