Fig. 7: Decalin encapsulation behaviors of 1.
From: Latent porosity of planar tris(phenylisoxazolyl)benzene
a (A) PXRD pattern for cis-decalin@1. (B) PXRD pattern for cis-decalin@1 shown in Panel A after heating at 60 °C for 6 h in vacuo. (C) Simulated PXRD pattern generated from single-crystal structure of 1β. (D) PXRD pattern for the resulting powder shown in Panel B after exposure to a vaporous cis-/trans-decalin (1:1) mixture for 6 days. b (A) PXRD pattern for as-prepared 1 (80 mg) after heating at 60 °C for 3 h. (B) PXRD pattern for the resulting powder shown in Panel A after being exposed to a vaporous cis-/trans-decalin mixture (1:1, w/w) for 6 days (for detailed procedures, see the Methods section). (C) PXRD pattern of a mixture of 1α and 1β and (D) PXRD pattern of a mixture of cis-decalin@1 and 1β estimated by Rietveld refinement. Simulated PXRD patterns of (E) 1α, (F) 1β, and (G) cis-decalin@1 generated from their single-crystal structures. c (A) PXRD pattern for the post-mixed powder with the 1α and 1β phases (1α:1β = 42:58). (B) PXRD pattern for the post-mixed powder shown in Panel A after exposure to vaporous cis -decalin for 6 days. The green and black arrows indicate peaks corresponding to 1β and cis -decalin@1, respectively. Simulated PXRD patterns generated from single-crystal structure of (C) 1α, (D) 1β, (E) cis -decalin@1. d (A) PXRD pattern of the solvent-free powder with the 1β phase after it was dissolved in CH2Cl2, concentrated in vacuo, washed with EtOH, and then dried in vacuo at room temperature. (B) PXRD pattern for the resulting powder shown in Panel A after heating at 60 °C for 3 h. Simulated PXRD patterns of (C) 1α and (D) 1β generated from their single-crystal structures.
