Fig. 1: Design of the PUF platform by material and process engineering. | Nature Communications

Fig. 1: Design of the PUF platform by material and process engineering.

From: Bright and stable anti-counterfeiting devices with independent stochastic processes covering multiple length scales

Fig. 1

a SPNs, with RGB emissions under the same wavelength excitation, are generated and aggregated in controlled sizes. The SPNs are mixed with photoresists and treated by a photolithography process. This cross-links the photoresists to improve the distribution stability of SPNs. b SPNs are randomly distributed in each microspot. Fractal edges and partially removed arrays are engineered during photolithography. The PUF devices can be applied as anticounterfeiting labels for different products. c Machine learning assisted identification process for end-user friendly security devices.

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