Fig. 5: The magnetized ZnSO₄ electrolyte enables a dendrite-free performance for Zn deposition.

a XRD patterns of Zn deposits (we disassembled the Zn||Ti cell after charging it for 4 h at a current density of 10 mA cm⁻², removed the Ti electrode, and collected the deposited Zn metal on the Ti electrode) in electrolytes with different magnetic pretreatment times. b AFM images of Zn deposits from the Ti electrodes of Zn||Ti cells subjected to a fixed current density of 10 mA cm⁻² in the original electrolyte. c AFM images of Zn deposits from the Ti electrodes of Zn||Ti cells subjected to a fixed current density of 10 mA cm⁻² in the electrolyte treated for 25 min. d AFM images of Zn deposits from the Ti electrodes of Zn||Ti cells subjected to a fixed current density of 10 mA cm⁻² in the electrolyte treated for 50 min. e, f In situ Raman spectra showing interfacial water (SO₄²⁻–H₂O, ~3400 cm⁻¹) on Ti electrodes from Zn||Ti cells subjected to linear sweep voltammetry in electrolytes pretreated at (e) 0 T and (f) 3 T. The measurements were conducted at a scan rate of 1 mV s⁻¹ and a temperature of 298 K. g Current-dependent in situ Raman spectra illustrating interfacial water (SO₄²⁻–H₂O, ~3400 cm⁻¹) on Ti electrode, correlated with nucleation dynamics. h OH stretching frequency shifts of SO₄²⁻–H₂O in Raman spectra: original solution vs. 3 T magnetic field pretreatment. i SEM and EDS images of Zn deposits on Ti electrodes from Zn||Ti cells subjected to linear sweep voltammetry in electrolytes pretreated at 0 T. j SEM and EDS images of Zn deposits on Ti electrodes from Zn||Ti cells subjected to linear sweep voltammetry in electrolytes pretreated at 3 T. k, l SEM images of Zn deposits on Ti electrodes formed at a constant potential of −1.6 V vs. Ag/AgCl in electrolytes pretreated at (k) 0 T and (l) 3 T.