Fig. 2 | npj Computational Materials

Fig. 2

From: Transparent conducting materials discovery using high-throughput computing

Fig. 2

a Schematic illustration of defect formation energies Ef as a function of the Fermi level EF of four defects Di in different charge states. bd Defect formation energies for n-, p-type dopings and the case of undopability, respectively. In all cases, D1 is a shallow acceptor, D2 a shallow donor, D3 a less stable shallow donor, and D4 a deep defect. In a, c and d, D1 and D4 are electron-killers. In d, D2D4 are hole-killers

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