Table. 1 The thickness of boron interface measured by ToF-SIMS.

From: Influence of radiation on borosilicate glass leaching behaviors

Time

Sqrt(t)

ZNBS1-un

ZNBS2-un

ZNBS 3-un

ZNBS1-0.3 dpa

ZNBS2-0.3 dpa

ZNBS3-0.3 dpa

h

h1/2

nm

2

1.4

359

426

252

4

2

841

596

6

2.5

189

128

170

1310

8

2.8

1552

1410

1079

12

3.5

237

189

307

2044

1251

18

4.2

2042

24

4.9

410

436

514

2135

2230

1720