Extended Data Fig. 2: Structural analysis of the chiral non-collinear AFM Mn3Ge and the normal-metal Cu.

a, Specular θ-2θ XRD pattern of single-crystalline Ru(0001) (black symbol) and single-phase Mn3Ge(0001)/Ru (red symbol) films grown on Al2O3(0001) substrates. b, Phi ϕ scan across the Al2O3 {\(10\bar 14\)}, Ru {\(10\bar 13\)}, and Mn3Ge {\(20\bar 21\)} reflections for the same film. c, Diffraction pattern of the epitaxial Cu film grown on Ru/Al2O3(0001) substrate. d, Atomic force micrographs of the single-phase Mn3Ge(0001) and epitaxial Cu films over 5 × 5 µm2 scan area (from left to right respectively). The root-mean-square roughness Rrms of the single-phase Mn3Ge (epitaxial Cu) is estimated to be 0.7 (0.6) nm. These data confirm that the single crystallinity and surface morphology of previous20 and current D019-Mn3Ge(0001) films are almost identical.