Extended Data Fig. 1: Comparison between PMMA and PPC residue coverage. | Nature Nanotechnology

Extended Data Fig. 1: Comparison between PMMA and PPC residue coverage.

From: Low Ohmic contact resistance and high on/off ratio in transition metal dichalcogenides field-effect transistors via residue-free transfer

Extended Data Fig. 1

a, b, AFM micrographs of the monolayer MoS2 on SiO2 substrate transferred using conventional PMMA (a) and PPC (b) methods. c, d, The contrast images of PMMA residues (black spots) extracted from the AFM micrograph taken on MoS2 (red dashed box in a) and SiO2 (green dashed box in a) regions to quantify residue coverage. PMMA residue coverage of 35.2% and 42.6% were obtained in MoS2 and SiO2 regions respectively. e, PPC residue coverage was extracted from b, and a value of 0.08% was obtained across the whole AFM image. f, AFM topography of the monolayer MoS2 on SiO2 substrate. Inset verifies the monolayer thickness (0.7 nm) from the height profile taken on the red line.

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