Extended Data Fig. 3: Control experiments for PEEM measurements under strong and extended UV exposure (~7 h of 100 nJ cm−2 per pulse, ~10 kJ cm−2 total dose) on (Cs0.05FA0.78MA0.17)Pb(I0.83Br0.17)3 samples.
From: Performance-limiting nanoscale trap clusters at grain junctions in halide perovskites
a, Optical absorption on freshly made samples (black squares), samples shipped under N2 (red dots) and shipped samples after extensive UV exposure in PEEM (blue triangles). b, Optical reflectivity image of an area partially exposed to UV in PEEM (red dashed oval, partly shown). c, Normalized PL emission of fresh, shipped and UV-exposed samples. Inset, PL intensity from unexposed (red dots) and UV-exposed (blue squares). d, PL map of the location in b, showing a slight reduction in PL intensity in the UV-exposed region. e, f, PEEM images of the traps (4.65-eV probe) at the beginning (e) and end (f) of the 7-h UV exposure. g, Intensity histograms for the images in e and f.
