Fig. 1: Fabrication of overlap JJ qubit.
From: Advanced CMOS manufacturing of superconducting qubits on 300 mm wafers
a, Photograph of the 300 mm wafer. b, Photograph of one die with subdie designs D1 and D2 highlighted. c, SEM image of an overlap JJ. d, Transmission electron microscopy image of a cross section of the junction (dashed line in c). e, Schematic representation of the key fabrication steps for an overlap JJ. Scale bars, 10 mm (b), 1 μm (c), 50 nm (d).
