Figure 3
From: Digital Etch Technique for Forming Ultra-Scaled Germanium-Tin (Ge 1−x Sn x ) Fin Structure
(a) (004) HRXRD curves of the as-grown Ge0.875Sn0.125, and the sample after 5-cycle and 8- cycle digital etch. (b) Experimental and simulated XRR curves of the as-grown Ge0.875Sn0.125, and the sample after 5 cycle plasma oxidation and HCl etch.
