Figure 6

(a) Cross sectional SEM images of parabolic Si nanostructures with varying a DRE process time from 0 sec to 60 sec. (b) Reflectance curves and (c) weighted reflectances of parabolic Si nanostructures with or without SiNx. For comparison, reflectance values of a bare Si wafer is compared together. The scale bar is 500 nm for all the SEM images.