Figure 2

(a–c) XPS sputter depth profiles corresponding to PCT of 0, 15, and 40 h in Fig. 1(a–c), respectively. The films were etched with Ar+ ion beam of 1.0 keV.
(a–c) XPS sputter depth profiles corresponding to PCT of 0, 15, and 40 h in Fig. 1(a–c), respectively. The films were etched with Ar+ ion beam of 1.0 keV.