Figure 2 | Scientific Reports

Figure 2

From: Anti-reflectance investigation of a micro-nano hybrid structure fabricated by dry/wet etching methods

Figure 2

Mask patterns in first step process and fabrication results observed in SEM (a) the mask patterns of tips, (b) the mask patterns of pits, (c) fabrication results of tips observed in SEM, and (d) fabrication results of pits observed in SEM. Two kinds of three-dimension micro structures are patterned by mask layer shown in (a) and (b). The sizes of mask layer and micro structures are shown in (a)–(d). The two kinds of micro structures obtain the same curve profile by controlling the recipes of them. They were etched to 100 micrometer in depth and 55 micrometer in lateral side. Though they have the same curve profile, they indicated different reflective feature when grown with nano structures.

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