Figure 7
From: Ab initio inspired design of ternary boride thin films
Impact of metal and boron (flat (open symbols) and puckered (half filled symbols) vacancies on the stability of α- and ω-structured W1−xTa x B2−z depending on the Ta/(Ta + W) ratio (a). Impact of vacancy concentration (shottky defects) on E f of the two discussed structures for WB2 (b) and TaB2 (c). The green and dark red symbols correspond to the α- and ω-structure, respectively.
