Figure 10
From: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
Metal oxide microstructures created by directed dewetting of metal oxide solutions on a DUV patterned surface. (a,b) AFM topography images and cross-section (contact mode), respectively, of an In precursor solution deposited on a silicon wafer coated with HTS and irradiated through a binary chromium mask (5 μm period) with 15 J/cm2. (c) Optical microscopy image of the same sample. (d,e) AFM topography images related to an InGaZnO precursor solution. The surface for deposition was also prepared from an HTS SAM on Si and irradiated through a binary chromium mask (5 μm period) with 15 J/cm2.
