Figure 2
From: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
(a) Molecular structures of the silanes used in this study. (b) Images of water drops deposited on HTS surfaces before and after DUV irradiation at 2.5 and 5 J/cm2. (c) Modification of the water contact angle by DUV irradiation for HTS, UTS, MPS, PFOTS and AHAPS on Si substrates.
