Figure 5
From: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
XPS analysis of the surface chemistry of a Si substrate showing the atomic composition of the surface of the Si substrate (i) before and (ii) after UTS grafting, (iii) after DUV irradiation (15 J/cm2) and iv) after regrafting of AHAPS on the irradiated substrate. The respective proportions of C, O and Si detected in the analyzed layer are given.
