Figure 7
From: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
Evolution of the chemical contrast monitored by friction AFM (mV) on the patterns produced by interference irradiation of a UTS SAM (pattern width 300 nm). Top row: AFM images corresponding to each irradiation dose. Bottom: graph illustrating the contrast evolution. The blue line is a guideline for the eye.
