Figure 8
From: Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
Contact mode AFM images, showing topography (top) and friction (bottom) images of (a) a UTS SAM surface, (b) UTS SAM surfaces patterned with DUV irradiation (20 J/cm2), with a 1.6 μm period chromium mask, and (c) the same patterned UTS surfaces after regrafting with an AHAPS precursor.
