Table 1 Performance of MoSe2 phototransistors measured at Pin = 10–100 mWcm−2.

From: High-Responsivity Multilayer MoSe2 Phototransistors with Fast Response Time

Type of MoSe2

μ (cm2v−1s−1)

R (AW−1)

D* (jones)

Response time (ms)

Reference

Multilayer flake (Exfoliation)

50.6

519.2

1.3 × 1012

1.7 (rise) 2.2 (fall)

This work

Few layer flake (Exfoliation)

19.7

97.1

15 (rise) 30 (fall)

15

Single layer film (CVD)i

0.013

60 (rise) 60 (fall)

16

Multilayer flake (CVD)i

10.1

93.7

400 (rise) 200 (fall)

17

Multilayer flake (Exfoliation)

5.9 or 16ii

0.1 or 16ii

1.0 × 1011ii

5 (fall)ii

13

Few layer flake (Exfoliation)

1.8

0.026

20 (rise) 20 (fall)

18

Few layer flake (Exfoliation)

5.1

238

7.6 × 1011

19

  1. iChemical vapor deposition.
  2. iiWith HfO2 encapsulation.