Figure 4 | Scientific Reports

Figure 4

From: A study on mechanism of resistance distribution characteristics of oxide-based resistive memory

Figure 4

Results from the OxRAM switching model for different filament lengths (L = 2.5, 3, and 3.5 nm) with the experimental switching layer thickness conditions described in Fig. 1(b). Here, ΦB00 = 0.28 eV, the resistance of filament at off-state = 105 Ω, the resistance of base layer = 2 × 104 Ω, and μO for insulating volume and conducting volume are 3 × 10−11 and 3 × 10−9 m2s−1V−1 respectively.

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