Table 1 Roughness information (shown in Fig. 3a) for surface control samples at a 500 nm FOV.

From: Advanced measurement and diagnosis of the effect on the underlayer roughness for industrial standard metrology

 

Surface

Ra [nm]

Rq [nm]

Rt [nm]

Piranha

Silicon oxide

0.11

0.14

1.15

Hafnium oxide

0.12

0.16

1.34

BOE 0 min

Silicon oxide

0.14

0.17

1.47

Hafnium oxide

0.13

0.17

1.35

BOE 1 min

Silicon oxide

0.16

0.20

1.93

Hafnium oxide

0.14

0.17

1.36

BOE 3 min

Silicon oxide

0.21

0.27

2.45

Hafnium oxide

0.14

0.17

1.49

BOE 5 min

Silicon oxide

0.25

0.32

2.98

Hafnium oxide

0.19

0.24

2.07

BOE 7.5 min

Silicon oxide

0.28

0.36

3.24

Hafnium oxide

0.22

0.28

2.19