Figure 4
In-situ XRD patterns (λ = 1.54 Å) of as-deposited LFP film during thermal annealing performed between 400 and 700 °C by step of 20 °C.
Figure 4 | Scientific Reports
In-situ XRD patterns (λ = 1.54 Å) of as-deposited LFP film during thermal annealing performed between 400 and 700 °C by step of 20 °C.
