Figure 2

Detailed fabrication step for the development of a dielectric sensor. Initially, starts with wafer cleaning followed by the oxidation process for oxide layer formation. Thin film aluminium/gold deposition as transducer material then photoresist coating. UV exposure was carried out to transfer the exact design of dielectric electrode. Later, etching process was performed followed by washing with acetone then with deionized water. In-depth serial steps involved in the fabrication process were specified.