Figure 5

Polarized optical microscopy (POM) images (a–f) and the crystal area coverage (g) of PLA/rubrene crystal films obtained by spin-coating different concentration rubrene solutions on 57.2 nm PLA modified FTO wafers after the solvent vapor annealing procedure (the 57.2 nm PLA modified FTO wafers were fabricated by spin-coating the PLA solutions on fluorine-doped tin-oxide (FTO) coated glass wafers, and the concentrations of rubrene solutions were a 0, b 1, c 3, d 5, e 7, and f 9 mg/mL, respectively).