Figure 2
From: Demonstration of nearly pinhole-free epitaxial aluminum thin films by sputter beam epitaxy
AFM images of Al/Al2O3 grown at (a) 150 °C, (b) 200 °C, and (c) 250 °C. The sample grown at 250 °C exhibits regions of particulate growth (d) and smooth regions (e). The scratch marks seen in the 150 °C sample were caused by post-growth handling.
