Figure 3
From: Demonstration of nearly pinhole-free epitaxial aluminum thin films by sputter beam epitaxy
2θ-ω XRD patterns of Al films on Al2O3 (001) substrates, with varying prebake temperature. Al (111) peak at 38.5°, Al2O3 (006) substrate peak at 41.6°. Note the defect peak at 44.9°.
