Figure 4

Images of (a) a bare silicon wafer (AFM), (b) silicon wafer with 5 oscillations of ZnO deposition at 150 °C (AFM), (c) silicon wafer with 30 oscillations of ZnO deposition at 150 °C (AFM) and (d) polyimide with 30 oscillations of ZnO deposition at 150 °C (SEM). Island formation and coalescence is observed, as well as delayed island growth on polymer substrate.