Figure 6 | Scientific Reports

Figure 6

From: Photocrosslinking and photopatterning of magneto-optical nanocomposite sol–gel thin film under deep-UV irradiation

Figure 6

Schematics of the photopatterning setups used in this study: (a) proximity printing and (b) interferometric lithography. AFM images and cross-sections of typical examples of structures obtained in (c) proximity printing (period: 1600 nm, width of structures: 800 nm, height: 125 nm, MNP: 1 vol%) and (d) interferometric lithography (period: 600 nm, width of structures: 300 nm, height: 50 nm, MNP: 0.4 vol%). Scale bars are 2 μm in each AFM images.

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