Figure 8

Simulation of plasma TFV and intracellular (PBMC) TFV-DP concentration–time profiles in mice following TAF dosing, using the IV/SQ PK model (Fig. 7) and implant release characteristics (Fig. 1). Circles represent individual experimental data; blue, plasma TFV; green, PBMC TFV-DP; lines represent model simulations (mean ± SD); red, plasma TFV; orange, PBMC TFV-DP. (A and E) goodness-of-fit of IV data used an internal validation. (B and F) Simulation of plasma TFV and PBMC TFV-DP concentrations for a low-releasing (0.23 mg d^-1) implant from a previous study³², where PBMC TFV-DP concentrations were not measured. (C and G) Simulation of plasma TFV and PBMC TFV-DP concentrations for the low-releasing (0.28 mg d^-1) implant group. (D and H) Simulation of plasma TFV and PBMC TFV-DP concentrations for the high-releasing (0.58 mg d^-1) implant group.