Table 3 Some optimized points with infinite C.D. for Ra–WL optimization.

From: Intelligent modeling and optimization of titanium surface etching for dental implant application

Goal

Temperature (°C)

Time (h)

Ra (µm)

WL (µg/cm2)

Ra maximize

25.00

0.00

0.36

3.60

Rz minimize

90.00

6.26

3.48

18.08

Ra = 0.5 µm

25.00

0.00

0.36

3.60

Rz minimize

25.79

0.99

0.50

4.72

Ra = 1 µm

36.57

3.63

1.00

6.91

Rz minimize

25.00

0.00

0.36

3.60

Ra = 1.5 µm

25.00

0.00

0.36

3.60

Rz minimize

37.72

8.00

1.50

8.78

Ra = 2 µm

48.29

6.75

2.00

11.59

Rz minimize

34.60

0.00

0.36

3.64