Figure 1
From: Amorphous carbon nitride dual-function anti-reflection coating for crystalline silicon solar cells
(a–e) 3D AFM topography images and grain size distributions histogram with fitted Gaussian curves for the coated films produced using a different deposition temperature of: (a) 25 °C, (b) 100 °C, (c) 150 °C, (d) 200 °C, and (e) 250 °C, and (f) variation of grain size, Ra and Rq with substrate temperature.
