Figure 3
From: Amorphous carbon nitride dual-function anti-reflection coating for crystalline silicon solar cells
(a) Variation of thickness with deposition time for CNx films deposited at 200 °C. The linear regression fit parameters are shown as an inset, and the error bars are shown as filled areas. (b) Energy dispersive X-ray spectra for the films at different deposition temperature. (c) Variation of N/C ratio with substrate temperature and deposition time. (d) Energy dispersive X-ray spectroscopy mapping for the CNx film deposited at 200 °C and 120 min.
