Figure 1
TEM images of (a) the Ru/SiO2/TiN nanostructures without pre-treatment after 50 s of Ru CVD, (b) the DMA-TMS treated Ru/SiO2/TiN nanostructures after 300 s of Ru CVD, and (c) the Ru/SiO2/TiN nanostructures without pre-treatment after 400 s of Ru CVD.
